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UID:20250511T034541EDT-80309dDmNK@132.216.98.100
DTSTAMP:20250511T074541Z
DESCRIPTION:Seminar and hands on demo: Heidelberg Instrument: Thermal scann
 ing probe lithography technology (NanoFrazor-tSPL) \n\nhttp://mnm.physics.
 mcgill.ca/content/seminar-and-hands-demo-heidelberg-instrument-thermal-sca
 nning-probe-lithography-technology-n\n\n13:00 - 14:00: presentation\, Q&A 
 session\n\n14:00 - 16:00: demonstration in cleanroom (everybody needs bunn
 y suits provided by the lab\, no shorts and open shoes)\n\nDear Nanotools 
 Users\, \n\nOur Nanofrazor system will have a major upgrade this month. An
  Engineer from Heidelberg will give a presentation regarding their unique 
 technology\, new capabilities and process development on the system. Here 
 it is the short list of the capabilities of the Nanofrazor\, the highlight
 ed parts are the new features after the upgrade.\n\n All existing nanotool
 s users are welcomed and feel free to spread the message. If you are inter
 ested\, please send me an email to confirm to your attendance. \n\nZhao Lu
  PhD\n\nManager\n\n51�Թ���Nanotools Micro\, Nanofabrication Facility\n\nMc
 Gill University\n\nAddress: 3600 University\, Montreal\, Quebec\, Canada\n
 \nTel: +1 514 3983310\n\nEmail: zhao.lu [at] mcgill.ca\n\n \n\nMain Featur
 es: \n\nHigh-resolution\n\nEasy patterning of nanostructures even with com
 plex geometries\; min. lateral features 15 nm\, Vertical resolution 2 nm\n
 \nThermal Scanning Probe Lithography\n\nNew approach to nanopatterning ena
 bling applications not otherwise feasible\n\nNon-invasive Lithography\n\nN
 o damage from charged particles\, no proximity effects\, clean lift-off\n
 \nCompatibility\n\nWith all standard pattern transfer methods: lift-off\, 
 etching\, etc – knowledge resource and best practices available in our “Re
 cipe Book”\n\nIn-situ Imaging\n\nImmediate control of patterned structures
 \n\nPrecise Overlay and Stitching\n\nMarkerless overlay and stitching accu
 racy 25 nm specified\, sub-10 nm overlay shown\n\nUnique Thermal Cantileve
 rs\n\nIntegrated microheater and distance sensor\; easy to exchange and ec
 onomical\n\nLaser Sublimation Module\n\nHigh-throughput exposure of coarse
  structures in the same exposure step\; 405 nm wavelength CW fiber laser\n
DTSTART:20220526T170000Z
DTEND:20220526T210000Z
LOCATION:Room 105\, Rutherford Physics Building\, CA\, QC\, Montreal\, H3A 
 2T8\, 3600 rue University
SUMMARY:Seminar and hands on demo: Heidelberg Instrument
URL:/miam/channels/event/seminar-and-hands-demo-heidel
 berg-instrument-339559
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